AIMS™ EUV tool platform: aerial-image based qualification of EUV masks (Conference Presentation)-Reference-Cited by-同舟云学术

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AIMS™ EUV tool platform: aerial-image based qualification of EUV masks (Conference Presentation)

Published:2018-10-23 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology 2018
language:
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Author:

Capelli Renzo,Hellweg Dirk,Dietzel Martin,Gehrke Ralf,Bauer Markus,Kersteen Grizelda

Publisher

SPIE

Reference12 articles.

1. NXE:3400B scanner, EUV volume manufacturing for 7nm node lithography and beyond;Mastenbroek,2018

2. https://www.eetimes.com/document.asp?doc_id=1333827&page_number=1

3. B. Kim, P. Buck, P. Morgan, T. Scherübl, T. Onoue, Panel discussion BACUS Photomasks Technology and EUV Lithography Conference 2018, Monterey, CA, USA.

4. Novel EUV mask absorber evaluation in support of next generation EUV imaging;Philipsen,2018

5. Actinic Review of EUV masks: Challenges and achievements in delivering the perfect mask for EUV production;Hellweg,2017

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mask defect detection by combining wiener deconvolution and illumination optimization;Microelectronic Engineering;2024-10

2. The power of algorithmic employed in a metrology system: AIMS EUV Digital Flex Illu;International Conference on Extreme Ultraviolet Lithography 2022;2022-12-01

3. Advances in Optics and Exposure Devices Employed in Excimer Laser/EUV Lithography;Handbook of Laser Micro- and Nano-Engineering;2021

4. Advances in Optics and Exposure Devices Employed in Excimer Laser/EUV Lithography;Handbook of Laser Micro- and Nano-Engineering;2020

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