1. 0.33 NA EUV systems for High Volume Manufacturing;Guido,2022
2. Intel technology engine fueling the semiconductor growth;Ryan,2022
3. EUV optics at ZEISS: status and outlook;Bartosz,2022
4. High-NA EUV imaging: the quest for resolution, depth-of-focus, and productivity
5. Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?;Andreas;J. of Micro/Nanopatterning, Materials, and Metrology,2022