Advances in Optics and Exposure Devices Employed in Excimer Laser/EUV Lithography
Author:
Publisher
Springer International Publishing
Link
https://link.springer.com/content/pdf/10.1007/978-3-030-63647-0_7
Reference66 articles.
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3. Borodovsky Y (2018) Moore’s law at and beyond 5nm. SPIE “Advanced lithography 2018”. Plenary presentation, 26 Feb. San Jose
4. Brouns D, Bendiksen A, Broman P, Casimiri E, Colsters P, Delmastro P, De Graaf D, Janssen P, van de Kerkhof M, Kramer R, Kruizinga M, Kunzel H, van der Meulen M, Ockwell D, Petre M, Smith D, Verbrugge B, van de Weg D, Wiley J, Wojewoda N, Zoldesi C, van Zwol P (2016) NXE pellicle: offering a EUV pellicle solution to the industry. In: Proceedings of SPIE 9776 “Extreme ultraviolet (EUV) lithography VII” 97761Y
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