NXE pellicle: offering a EUV pellicle solution to the industry-Reference-Cited by-同舟云学术

NXE pellicle: offering a EUV pellicle solution to the industry

Published:2016-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography VII
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Author:

Brouns Derk¹,Bendiksen Aage²,Broman Par¹,Casimiri Eric¹,Colsters Paul¹,Delmastro Peter²,de Graaf Dennis¹,Janssen Paul¹,van de Kerkhof Mark¹,Kramer Ronald¹,Kruizinga Matthias¹,Kuntzel Henk¹,van der Meulen Frits¹,Ockwell David¹,Peter Maria¹,Smith Daniel¹,Verbrugge Beatrijs¹,van de Weg David¹,Wiley Jim³,Wojewoda Noelie¹,Zoldesi Carmen¹,van Zwol Pieter¹

Affiliation:

1. ASML Netherlands B.V. (Netherlands)

2. ASML (United States)

3. ASML US, Inc. (United States)

Publisher

SPIE

Reference7 articles.

1. Investigation of EUV pellicle feasibility;Scaccabarozzi,2013

2. Extreme ultraviolet lithography: Challenges and progress;Benschop,2001

3. EUV Pellicle Development for Mask Defect Control;Shroff,2006

4. Realization of EUV pellicle with single crystal silicon membrane;Akiyama,2009

5. High transmission pellicles for extreme ultraviolet lithography reticle protection

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