Development of an EUV Microscope with Focused Coherent EUV Based on Coherent Diffraction Imaging Method for Defect Evaluation on an EUV Mask-Reference-Cited by-同舟云学术

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Development of an EUV Microscope with Focused Coherent EUV Based on Coherent Diffraction Imaging Method for Defect Evaluation on an EUV Mask

Published:2018-01-19 Issue:3 Volume:101 Page:11-16
ISSN:1942-9533
Container-title:Electronics and Communications in Japan
language:en
Short-container-title:Electron Comm Jpn

Author:

HARADA TETSUO¹,HASHIMOTO HIRAKU¹,WATANABE TAKEO¹

Affiliation:

1. University of Hyogo; Japan

Funder

New Energy and Industrial Technology Development Organization

Publisher

Wiley

Subject

Applied Mathematics,Electrical and Electronic Engineering,Computer Networks and Communications,General Physics and Astronomy,Signal Processing

Reference15 articles.

1. An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm;Goldberg;SPIE Proc,2011

2. Actinic detection of multilayer defects on EUV mask blanks using LPP light source and dark-field imaging;Tezuka;SPIE Proc,2004

3. At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscope;Haga;J Vac Sci Technol B,2000

4. At-wavelength extreme ultraviolet lithography mask observation using a high-magnification objective with three multilayer mirrors;Toyoda;Appl Phys Express,2012

5. Actinic review of EUV masks: First results from the AIMSۛ EUV system integration;Weiss;SPIE Proc,2014

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mask defect detection by combining wiener deconvolution and illumination optimization;Microelectronic Engineering;2024-10

2. An abrasive-free chemical polishing method assisted by nickel catalyst generated by in situ electrochemical plating;Review of Scientific Instruments;2020-04-01

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