The economic impact of EUV lithography on critical process modules-Reference-Cited by-同舟云学术

The economic impact of EUV lithography on critical process modules

Published:2014-04-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Mallik Arindam¹,Horiguchi Naoto¹,Bömmels Jürgen¹,Thean Aaron¹,Barla Kathy¹,Vandenberghe Geert¹,Ronse Kurt¹,Ryckaert Julien¹,Mercha Abdelkarim¹,Altimime Laith¹,Verkest Diederik¹,Steegen An¹

Affiliation:

1. IMEC (Belgium)

Publisher

SPIE

Reference15 articles.

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5. Neisser, Mark and Stefan Wurm. “ITRS lithography roadmap: status and challenges”, 1.4 (2012): 217–222. Retrieved 4 Feb. 2013, from doi:10.1515/aot-2012-0045

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