Complete data preparation flow for Massively Parallel E-Beam lithography on 28nm node full-field design-Reference-Cited by-同舟云学术

Complete data preparation flow for Massively Parallel E-Beam lithography on 28nm node full-field design

Published:2016-03-22 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Fay Aurélien,Browning Clyde,Brandt Pieter,Chartoire Jacky,Bérard-Bergery Sébastien,Hazart Jérôme,Chagoya Alexandre,Postnikov Sergei,Saib Mohamed,Lattard Ludovic,Schavione Patrick

Publisher

SPIE

Reference14 articles.

1. Performance validation of MAPPER’s FLX-1200;Wieland,2015

2. Matching of beams on the MAPPER MATRIX tool: a simulation study;Belledent,2013

3. Demonstration of electronic design automation flow for massively parallel e-beam lithography

4. Alternative stitching method for massively parallel e-beam lithography

5. Throughput enhancement technique for MAPPER maskless lithography;Wieland,2010

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1. Generalized performance optimization for massively-parallel electron-beam systems;Journal of Vacuum Science & Technology B;2023-06-26

2. Reduction of exposing time in massively-parallel E-beam systems;Journal of Vacuum Science & Technology B;2022-05

3. Shape and dose control for proximity effect correction on massively parallel electron-beam systems;Journal of Vacuum Science & Technology B;2020-11

4. Variable shaped beam lithography capabilities enhancement by "small-shots" correction;Photomask Technology 2018;2018-10-03

5. Performance validation of Mapper FLX-1200;34th European Mask and Lithography Conference;2018-09-19