1. Inverse lithography technology (ILT): What is the impact to the photomask industry?;Pang,2006
2. Photonic curvilinear data processing;Browning,2014
3. MBMW-101: World’s 1st high-throughput multi-beam mask writer;Klein,2016
4. Multi-beam mask writer MBM-1000;Matsumoto,2018
5. Complete data preparation flow for Massively Parallel E-Beam lithography on 28nm node full-field design;Fay,2016