Demonstration of electronic design automation flow for massively parallel e-beam lithography-Reference-Cited by-同舟云学术

Demonstration of electronic design automation flow for massively parallel e-beam lithography

Published:2014-08-11 Issue:3 Volume:13 Page:031306
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Brandt Pieter¹,Belledent Jérôme²,Tranquillin Céline³,Figueiro Thiago³,Meunier Stéfanie²,Bayle Sébastien³,Fay Aurélien²,Milléquant Matthieu³,Icard Beatrice²,Wieland Marco¹

Affiliation:

1. MAPPER Lithography, Computerlaan 15, Delft 2628 XK, The Netherlands

2. CEA, LETI, 17 Rue des Martyrs, GRENOBLE Cedex 9 38054, France

3. ASELTA Nanographics, 7 Parvis Louis Néel, GRENOBLE Cedex 9 38040, France

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Complete data preparation flow for Massively Parallel E-Beam lithography on 28nm node full-field design;SPIE Proceedings;2016-03-22

2. Comparison between e-beam direct write and immersion lithography for 20-nm node;Journal of Micro/Nanolithography, MEMS, and MOEMS;2015-08-12

3. Challenges and requirements of mask data processing for multi-beam mask writer;Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII;2015-07-09

4. Alternative stitching method for massively parallel e-beam lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2015-07-02

5. "Fast" and "thick" e-beam resists exposed with multi-beam tool at 5 keV for implants and mature nodes: experimental and simulated model study;Alternative Lithographic Technologies VII;2015-03-19