Comparison between e-beam direct write and immersion lithography for 20-nm node-Reference-Cited by-同舟云学术

Comparison between e-beam direct write and immersion lithography for 20-nm node

Published:2015-08-12 Issue:3 Volume:14 Page:031214
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Brandt Pieter¹,Sardana Charu²,Ibbotson Dale²,Wieland Marco¹,Fay Aurelien³

Affiliation:

1. MAPPER Lithography, Computerlaan 15, 2628 XK Delft, The Netherlands

2. Altera Corporation, 101 Innovation Drive, San Jose, California 95134, United States

3. CEA-Leti, 17 Rue des Martyrs, 38054 GRENOBLE Cedex 9, France

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. Performance validation of MAPPER’s FLX-1200;Wieland,2015

2. Roadmap to sub-nanometer OPC model accuracy

3. Demonstration of electronic design automation flow for massively parallel e-beam lithography

4. Corrections to proximity effects in electron beam lithography. I. Theory

5. Projection Printing Characterization

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1. A New Simulation Method for 3-D Electron Beam Lithography;2023 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO);2023-07-31

2. Volatile vapor knife of immersion lithography hood using solutal Marangoni effect;Journal of Vacuum Science & Technology B;2022-09

3. Towards alternative 3D nanofabrication in macroscopic working volumes;Measurement Science and Technology;2018-10-05

4. Complete data preparation flow for Massively Parallel E-Beam lithography on 28nm node full-field design;SPIE Proceedings;2016-03-22