Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond-Reference-Cited by-同舟云学术

Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond

Published:2014-10-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Davydova Natalia,van Setten Eelco,de Kruif Robert,Connolly Brid,Fukugami Norihito,Kodera Yutaka,Morimoto Hiroaki,Sakata Yo,Kotani Jun,Kondo Shinpei,Imoto Tomohiro,Rolff Haiko,Ullrich Albrecht,Jaganatharaja Ramasubramanian Kottumakulal,Lammers Ad,Oorschot Dorothe,Man Cheuk-Wah,Schiffelers Guido,van Dijk Joep

Publisher

SPIE

Reference22 articles.

1. EUV lithography: NXE platform performance overview

2. Imaging performance and challenges of 10nm and 7nm Logic nodes with 0.33 NA EUV;van Setten,2014

3. Achievements and challenges of EUV mask imaging;Davydova,2014

4. Performance overview of ASML’s NXE platform;van den Horst,2014

5. Imaging performance improvements by EUV mask stack optimization;Davydova,2011

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