Author:
Heo Jinseok,Xu Man,Maas Diederik
Subject
Atomic and Molecular Physics, and Optics
Cited by
2 articles.
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1. Chemical metrology on latent resist images;Micro and Nano Engineering;2023-06
2. Tip-to-tip variation mitigation in extreme ultraviolet lithography for 7 nm and beyond metallization layers and design rule analysis;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-11