Chemical metrology on latent resist images
-
Published:2023-06
Issue:
Volume:19
Page:100181
-
ISSN:2590-0072
-
Container-title:Micro and Nano Engineering
-
language:en
-
Short-container-title:Micro and Nano Engineering
Author:
van Es Maarten,Tamer Selman,Bloem Elin,Fillinger Laurent,van Zeijl Elfi,Maturová Klára,van der Donck Jacques,Willekers Rob,Chuang Adam,Maas Diederik
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference55 articles.
1. Nanomanufacturing: a perspective;Liddle;ACS Nano,2016
2. The Transfer of Photoresist LER Through Etch;Pawloski,2006
3. High NA EUV: A challenge for metrology, an opportunity for atomic force microscopy;Moussa;Proc. SPIE.,2021
4. The application of a Rapid Probe Microscope (RPM) for investigating 1D and 2D structures from EUV lithography;Humphris,2020