EUV mask with advanced hybrid black border suppressing EUV and DUV OOB light reflection-Reference-Cited by-同舟云学术

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EUV mask with advanced hybrid black border suppressing EUV and DUV OOB light reflection

Published:2018-06-12 Issue: Volume: Page:
ISSN:
Container-title:Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
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Author:

Watanabe Genta,Fukugami Norihito,Komizo Toru,Kodera Yutaka,Konishi Toshio

Publisher

SPIE

Reference10 articles.

1. Black border with etched multilayer on EUV mask;Fukugami,2012

2. Impact of an etched EUV mask black border on imaging and overlay;Davydova,2012

3. Impact of an etched EUV mask Black Border on imaging and overlay: part II;Davydova,2013

4. Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond;Davydova,2014

5. Effects of mask absorber thickness on printability in EUV lithography with high resolution resist;Kamo,2008

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High-power EUV lithography: spectral purity and imaging performance;Journal of Micro/Nanolithography, MEMS, and MOEMS;2020-09-22

2. Development of an EUV and OoB Reflectometer at NewSUBARU synchrotron light facility;Photomask Technology 2019;2019-09-26

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