1. EUV lithography at insertion and beyond;Borodovsky,2012
2. Self-aligned Triple Patterning for Continuous IC Scaling to Half-Pitch 15nm;Chen,2011
3. Sidewall spacer quadruple patterning for 15-nm half-pitch;Xu,2011
4. Technological merits, process complexity, and cost analysis of self-aligned multiple patterning;Chen,2012
5. A comparative study of self-aligned quadruple and sextuple patterning techniques for sub-15nm IC scaling;Chen,2013