1. ITRS (International Technology Roadmap for Semiconductors) Report: Lithography, 2013.
2. Edge placement: foundation for Moore’s Law extension,;Borodovsky,2015
3. A comparative study of self-aligned quadruple and sextuple patterning techniques for sub-15nm IC scaling,;Chen,2013
4. Sidewall spacer quadruple patterning for 15-nm half-pitch,;Xu,2011
5. Process characteristics and layout decomposition of self-aligned sextuple patterning,;Kang,2013