First light at EBL2-Reference-Cited by-同舟云学术

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First light at EBL2

Published:2017-03-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Koster Norbert¹,te Sligte Edwin¹,Molkenboer Freek¹,Deutz Alex¹,van der Walle Peter¹,Muilwijk Pim¹,Mulckhuyse Wouter¹,Oostdijck Bastiaan¹,Hollemans Christiaan¹,Nijland Björn¹,Kerkhof Peter¹,van Putten Michel¹,Westerhout Jeroen¹

Affiliation:

1. TNO (Netherlands)

Publisher

SPIE

Reference7 articles.

1. EUV progress toward HVM readiness

2. Strategy for Minimizing EUV Optics;Harned,2008

3. A New Mask Exposure and Analysis Facility;te Sligte,2014

4. EBL2, a flexible, controlled EUV exposure and surface analysis facility;te Sligte,2016

5. EBL2: high power EUV exposure facility;te Sligte,2016

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. On the Opportunity of Liquid Metal Rotated Anode for High Brightness X-Ray Source;IEEE Transactions on Plasma Science;2021-02

2. Study of EUV reticle storage effects through exposure on EBL2 and NXE;Extreme Ultraviolet Lithography 2020;2020-11-04

3. Lifetime test on EUV photomask with EBL2;Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology;2019-06-27

4. Characterization of EBL2 EUV exposure facility;International Conference on Extreme Ultraviolet Lithography 2017;2017-10-16

5. Latest developments on EUV reticle and pellicle research and technology at TNO;33rd European Mask and Lithography Conference;2017-09-28

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