Lifetime test on EUV photomask with EBL2-Reference-Cited by-同舟云学术

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Lifetime test on EUV photomask with EBL2

Published:2019-06-27 Issue: Volume: Page:
ISSN:
Container-title:Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
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Author:

Wu Chien-Ching,Bender Markus,Jonckheere Rik,Scholze Frank,Bekman Herman,van Putten Michel,de Zanger Rory,Ebeling Rob,Westerhout Jeroen,Nicolai Kyri,van Veldhoven Jacqueline,de Rooij-Lohmann Véronique,Kievit Olaf,Deutz Alex

Publisher

SPIE

Reference7 articles.

1. EBL2, a flexible, controlled EUV exposure and surface analysis facility;te Sligte,2016

2. EBL2: high power EUV exposure facility;te Sligte,2016

3. First light at EBL2;Koster,2017

4. Single element and metal alloy novel EUV mask absorbers for improved imaging;Philipsen,2017

5. Progress in EUV lithography toward manufacturing;Kim,2017

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests;Journal of Vacuum Science & Technology B;2023-01-01

2. Picometer sensitivity metrology for EUV absorber phase;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-08-12

3. Study of EUV reticle storage effects through exposure on EBL2 and NXE;Extreme Ultraviolet Lithography 2020;2020-11-04

4. EBL2 an EUV (Extreme Ultra-Violet) lithography beam line irradiation facility;International Conference on Extreme Ultraviolet Lithography 2019;2019-09-26

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