Lithography hotspot detection using a double inception module architecture-Reference-Cited by-同舟云学术

Lithography hotspot detection using a double inception module architecture

Published:2019-03-22 Issue:01 Volume:18 Page:1
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Chen Jing¹,Lin Yibo²,Guo Yufeng¹,Zhang Maolin¹,Alawieh Mohamed Baker²,Pan David Z.²

Affiliation:

1. Nanjing University of Posts and Telecommunications, College of Electronic and Optical Engineering an

2. University of Texas at Austin, Department of Electrical and Computer Engineering, Austin, Texas

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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