Litho-NeuralODE 2.0: Improving hotspot detection accuracy with advanced data augmentation, DCT-based features, and neural ordinary differential equations
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Hardware and Architecture,Software
Reference58 articles.
1. Design for manufacturing with emerging nanolithography;Pan;IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.,2013
2. Fast and scalable parallel layout decomposition in double patterning lithography;Zhao;Integration,2014
3. Design for manufacturability and reliability in extreme-scaling VLSI;Yu;Sci. China Inf. Sci.,2016
4. Design rule checking and VLSI;Traynor;Integration,1987
5. Application of optical proximity correction technology;Cai;Sci. China Inf. Sci.,2008
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1. Lithography hotspot detection through multi-scale feature fusion utilizing feature pyramid network and dense block;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-02-10
2. Litho-AsymVnet: super-resolution lithography modeling with an asymmetric V-net architecture;Science China Information Sciences;2023-11-02
3. CompressKey—Near Lossless Layout Compression and Encryption Using Convolutional Auto-Encoder Model and Expansion-Reduction Pattern Techniques;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023-04
4. CmpCNN: CMP Modeling with Transfer Learning CNN Architecture;ACM Transactions on Design Automation of Electronic Systems;2022-10-27
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