Author:
Yu Bei,Xu Xiaoqing,Roy Subhendu,Lin Yibo,Ou Jiaojiao,Pan David Z.
Publisher
Springer Science and Business Media LLC
Reference173 articles.
1. Moore G E. Lithography and the future of Moore’s law. Proc SPIE, 1995, 2438: 2–17
2. Pan D Z, Yu B, Gao J-R. Design for manufacturing with emerging nanolithography. IEEE Trans Comput Aided Des Integr Circ Syst, 2013, 32: 1453–1472
3. Yu B, Pan D Z. Design for Manufacturability with Advanced Lithography. Springer, 2015
4. Reis R, Cao Y, Wirth G. Circuit Design for Reliability. Springer, 2014
5. Maricau E, Gielen G. Computer-aided analog circuit design for reliability in nanometer CMOS. IEEE J Emerg Sel Top Circ Syst, 2011, 1: 50–58
Cited by
29 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献