Self-aligned quadruple patterning to meet requirements for fins with high density-Reference-Cited by-同舟云学术

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Self-aligned quadruple patterning to meet requirements for fins with high density

Published:2016-05-14 Issue: Volume: Page:
ISSN:1818-2259
Container-title:SPIE Newsroom
language:
Short-container-title:SPIE Newsroom

Author:

Altamirano-Sánchez Efraín,Tao Zheng,Gunay-Demirkol Anil,Lorusso Gian,Hopf Toby,Everaert Jean-Luc,Clark William,Constantoudis Vassilios,Sobieski Daniel,Ou Fung Suong,Hellin David

Publisher

SPIE-Intl Soc Optical Eng

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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