1. Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme;mohanty;Proc of SPIE,0
2. SAQP Pitch Walking Improvement Path Finding by Simulation;yang;2019 International Symposium on Dry Process (DPS),0
3. Self-aligned Quadruple Patterning Integration using spacer on spacer pitch splitting at the resist level for sub 32nm pitch applications;raley;Proc of SPIE,0
4. Optimization of the CD uniformity (CDU) in silicon oxide spacer process for 5nm FIN SAQP process flow;qingqing;2020 China Semiconductor Technology International Conference (CSTIC),0
5. An Innovative Indicator to Evaluate DRAM Cell Transistor Leakage Current Distribution