CNT EUV pellicle tunability and performance in a scanner-like environment-Reference-Cited by-同舟云学术

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CNT EUV pellicle tunability and performance in a scanner-like environment

Published:2021-03-23 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography XII
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Author:

Timmermans Marina Y.,Pollentier Ivan,Korytov Maxim,Nuytten Thomas,Sergeant Stefanie,Conard Thierry,Meersschaut Johan,Zhang Yide,Dialameh Masoud,Alaerts Wilfried,Jazaeri Ehsan,Spampinato Valentina,Franquet Alexis,Brems Steven,Huyghebaert Cedric,Gallagher Emily E.

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Protective Free-Standing Films for Projection Lithography Installations in the Extreme UV Range;Russian Microelectronics;2023-10

2. Protective Freely Hanging Films for Projection Lithography Installations in the Extreme UV Range;Микроэлектроника;2023-09-01

3. CNT-based pellicles for the next generation of EUV scanners;Japanese Journal of Applied Physics;2023-03-10

4. Renewable single-walled carbon nanotube membranes for extreme ultraviolet pellicle applications;Carbon;2022-10

5. EUV mask defect material characterization through actinic lensless imaging;Metrology, Inspection, and Process Control XXXVI;2022-05-26

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