Novel membrane solutions for the EUV pellicle: better or not?-Reference-Cited by-同舟云学术

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Novel membrane solutions for the EUV pellicle: better or not?

Published:2017-03-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Pollentier Ivan¹,Lee Jae Uk¹,Timmermans Marina¹,Adelmann Christoph¹,Zahedmanesh Houman¹,Huyghebaert Cedric¹,Gallagher Emily E.¹

Affiliation:

1. IMEC (Belgium)

Publisher

SPIE

Reference22 articles.

1. Pellicle protection of integrated circuit (IC) masks;Hershel,1981

2. Pellicle for ArF excimer laser photolithography

3. X-ray interactions: photoabsorption, scattering, transmission, and reflection at E=50-30000 eV, Z=1-92;Henke,1993

4. Progress on EUV pellicle development;Zoldesi,2014

5. Fabrication of a full-size EUV pellicle based on silicon nitride;Goldfarb,2015

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1. Unraveling strength and mechanical properties of CNT-based EUV pellicle;Optical and EUV Nanolithography XXXVII;2024-04-10

2. From Jekyll to Hyde and Beyond: Hydrogen’s Multifaceted Role in Passivation, H-Induced Breakdown, and Charging of Amorphous Silicon Nitride;The Journal of Physical Chemistry Letters;2024-01-18

3. Protective Free-Standing Films for Projection Lithography Installations in the Extreme UV Range;Russian Microelectronics;2023-10

4. Protective Freely Hanging Films for Projection Lithography Installations in the Extreme UV Range;Микроэлектроника;2023-09-01

5. Study on ZrSi2 as a Candidate Material for Extreme Ultraviolet Pellicles;Membranes;2023-08-14

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