Author:
Seko Tomoaki,Kasai Tatsuya,Serizawa Ryuuichi,Dei Satoshi,Sakai Tatsuya
Cited by
3 articles.
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1. Ultra-high carbon fullerene-based spin-on-carbon hardmasks;Advances in Patterning Materials and Processes XL;2023-05-01
2. Recent Progress on Spin-on Inorganic Materials;2020 International Symposium on Semiconductor Manufacturing (ISSM);2020-12-15
3. Are surfaces of silicon hardmasks adaptive?;Advances in Patterning Materials and Processes XXXVII;2020-03-23