Large-field particle beam optics for projection and proximity printing and for maskless lithography-Reference-Cited by-同舟云学术

Large-field particle beam optics for projection and proximity printing and for maskless lithography

Published:2003-01-01 Issue:1 Volume:2 Page:34
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Loeschner Hans

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference24 articles.

1. Overview of the ion projection lithography European MEDEA and international program

2. H. Loeschner, G. Stengl, A. Wolter, and R. Kaesmaier, “Performance of ion projection lithography (IPL),”Proc. SEMI Technology Symposium 2001, Chiba, Japan, Dec. 5–7, 2001, pp. 8-52–8-55, Semiconductor Equipment and Materials International (2001).

3. A. Chalupka, H. Buschbeck, E. Haugeneder, R. Korntner, G. Lammer, W. Lammer, H. Loeschner, G. Stengl, and P. W. H. de Jager, “Ion projection lithography—future tool concepts,” 5th Intl. SEMATECH Next Generation Lithography (NGL) Workshop, Pasadena, CA 29 Aug. 2001, http://www.sematech.org/public/resources/litho/meetings/ngl/ng10901/Technical%20Champions%20Presentations/IPL%20Presentation%20NGL%20WS%202001.pdf.

4. Measures to achieve 20nm IPL stencil mask distortion

5. S. Schunck, pdf solutions/aiss division, Munich, Germany, private communication (Sep. 2001).

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