Overview of the ion projection lithography European MEDEA and international program
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SPIE
Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Limit resolution in low-voltage FIB without correction of chromatic aberration;Bulletin of the Russian Academy of Sciences: Physics;2008-11
2. Evaluation of focused O+ ion beams as a tool for making resist masks by reactive etching;Russian Microelectronics;2006-09
3. Aberration properties of a combined axisymmetric electromagnetic mirror;Doklady Physics;2006-05
4. Masks for Extreme Ultraviolet Lithography;Handbook of Photomask Manufacturing Technology;2005-04-07
5. Progress in proximity electron lithography: demonstration of print and overlay performance using the low-energy electron beam proximity-projection lithography β tool;Journal of Micro/Nanolithography, MEMS, and MOEMS;2004-07-01
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