Progress in proximity electron lithography: demonstration of print and overlay performance using the low-energy electron beam proximity-projection lithography β tool

Author:

Omori Shinji

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference39 articles.

1. Electron-Beam Proximity Printing—A New High-Speed Lithography Method for Submicron Structures

2. Low energy electron-beam proximity projection lithography: Discovery of a missing link

3. Completion of the β tool and the recent progress of low energy e-beam proximity projection lithography

4. M. Yoshizawa, K. Oguni, H. Nakano, K. Amai, S. Nohama, S. Moriya, and T. Kitagawa, “Resolution-limiting factors in LEEPL: Mask, projection, and resist process,” presented at the 47th Int. Conf. Electron, Ion and Photon Beam Technol. Nanofabrication, 27–30 May 2003, Tampa, FL.

5. LEEPL mask fabrication using SOI substrates

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