Bound PAG resists: an EUV and electron beam lithography performance comparison of fluoropolymers-Reference-Cited by-同舟云学术

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Bound PAG resists: an EUV and electron beam lithography performance comparison of fluoropolymers

Published:2011-03-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Bozano Luisa D.,Brock Phillip J.,Truong Hoa D.,Sanchez Martha I.,Wallraff Gregory M.,Hinsberg William D.,Allen Robert D.,Fujiwara Masaki,Maeda Kazuhiko

Publisher

SPIE

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent developments in photoresists for extreme-ultraviolet lithography;Polymer;2023-07

2. Sensitivity enhancement of chemically amplified EUV resist by adding diphenyl sulfone derivatives;Advances in Patterning Materials and Processes XXXVII;2020-03-23

3. Sensitivity enhancement of chemically amplified EUV resists by adding acid-generating promoters;Japanese Journal of Applied Physics;2017-05-12

4. Comparative study of resists and lithographic tools using the Lumped Parameter Model;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11

5. Energy deposition in ultrathin extreme ultraviolet resist films: extreme ultraviolet photons and keV electrons;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-08-23

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