Sensitivity enhancement of chemically amplified EUV resist by adding diphenyl sulfone derivatives-Reference-Cited by-同舟云学术

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Sensitivity enhancement of chemically amplified EUV resist by adding diphenyl sulfone derivatives

Published:2020-03-23 Issue: Volume: Page:
ISSN:
Container-title:Advances in Patterning Materials and Processes XXXVII
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Author:

Okamoto Kazumasa,Kawai Shunpei,Kozawa Takahiro

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Sensitization of polymethacrylate resist with adding acid-generating promoters upon exposure to EUV light;Japanese Journal of Applied Physics;2023-11-01

2. Study on deprotonation from radiation-induced ionized acrylate polymers including acid-generation promoters for improving chemically amplified resists;Japanese Journal of Applied Physics;2022-05-25

3. Study of plasma etching impact on chemoepitaxy directed self-assembly;Journal of Vacuum Science & Technology A;2021-05

4. Real-time dose control for electron-beam lithography;Nanotechnology;2020-12-08

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