Understanding the litho-impact of phase due to 3D mask effects when using off-axis illumination-Reference-Cited by-同舟云学术

Understanding the litho-impact of phase due to 3D mask effects when using off-axis illumination

Published:2015-09-04 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

de Winter L.,Last T.,Davydova N.,Finders J.

Publisher

SPIE

Reference9 articles.

1. “Mask 3D induced phase and the mitigation by absorber optimization”, Proc. SPIE 9426, Optical Microlithography XXVIII, 942605 (March 18, 2015); doi:10.1117/12.2178288; http://dx.doi.org/10.1117/12.2178288

2. J. Finders, et.al., PMJ(2015)

3. Impact of mask absorber thickness on the focus shift effect in extreme ultraviolet lithography

4. M.C. Lam, & A.R. Neureuther,, Proc.Of SPIE, Vol. 6349, 63492H, (2006).

5. J. Ruoff, et.al., Bacus (23) 11, november (2007)

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