Rigorous EUV absorber model for the mask modeling with deep learning techniques
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Published:2021-11-03
Issue:04
Volume:20
Page:
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ISSN:2708-8340
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Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
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language:
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Short-container-title:J. Micro/Nanopattern. Mats. Metro.
Author:
Yuan Pengpeng1,
Xu Peng1,
Fan Taian1,
Wei Yayi1
Affiliation:
1. Chinese Academy of Science, Institute of Microelectronics, Beijing
Funder
National Natural Science Foundation of China
Publisher
SPIE-Intl Soc Optical Eng