Author:
Zaidi Saleem H.,Brueck Steven R. J.
Cited by
5 articles.
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1. Double-exposure mask synthesis using inverse lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2007-10-01
2. Optical lithography for nanotechnology;Nanoengineering: Fabrication, Properties, Optics, and Devices III;2006-08-31
3. High-throughput hybrid optical maskless lithography: all-optical 32-nm node imaging;SPIE Proceedings;2005-05-06
4. Benefits and limitations of immersion lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2004-01-01
5. Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-09