Author:
Fritze M.,Tyrrell B.,Fedynyshyn T.,Rothschild M.,Brooker P.
Cited by
6 articles.
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1. Far-UV solid state lasers for semiconductor processing;Nonlinear Frequency Generation and Conversion: Materials, Devices, and Applications IX;2010-02-11
2. Interference assisted lithography for patterning of 1D gridded design;Alternative Lithographic Technologies;2009-03-13
3. Design for Manufacturability and Yield;System-on-Chip Test Architectures;2008
4. Immersion patterning down to 27 nm half pitch;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2006
5. Nanopatterning with UV Optical Lithography;MRS Bulletin;2005-12