Enabling faster VSB writing of 193i curvilinear ILT masks that improve wafer process windows for advanced memory applications-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Enabling faster VSB writing of 193i curvilinear ILT masks that improve wafer process windows for advanced memory applications

Published:2020-10-07 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology 2020
language:
Short-container-title:

Author:

Pang Linyong (Leo),Russell Ezequiel V.,Baggenstoss Bill,Lu Yang,Lee Michael,Digaum Jennefir Ping,Yang Ming-Chuan,Pearman Ryan,Ungar P. Jeffrey,Sha Lu,Bouaricha Ali,Pomerantsev Michael,Niewczas Mariusz,Wang Kechang,Su Bo,Meyer Michael,Fujimura Aki

Publisher

SPIE

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Why the mask world is moving to curvilinear;DTCO and Computational Patterning III;2024-04-10

2. Balancing mask manufacturability and image quality with inverse lithography: a study on variable fracture sizes;Optical and EUV Nanolithography XXXVII;2024-04-10

3. Make the impossible possible: use variable-shaped beam mask writers and curvilinear full-chip inverse lithography technology for 193i contacts/vias with mask-wafer co-optimization;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-02-06

4. You do not need 1 nm contours for curvilinear shapes: pixel-based computing is the answer;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-11-24

5. You don’t need 1nm contours for curvilinear shapes: pixel-based computing is the answer;Photomask Technology 2022;2022-12-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP