Why the mask world is moving to curvilinear-Reference-Cited by-同舟云学术

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Why the mask world is moving to curvilinear

Published:2024-04-10 Issue: Volume:6154 Page:40
ISSN:
Container-title:DTCO and Computational Patterning III
language:
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Author:

Pang Linyong,Fujimura Aki

Publisher

SPIE

Reference22 articles.

1. Fast inverse lithography technology

2. Pushing the Lithography Limit: Applying Inverse Lithography Technology (ILT) at 65nm generation;Hung,2006

3. Inverse Lithography Technology at Chip Scale, 31st International Symposium of Microlithography;Lin,2006

4. Laser and e-beam mask-to-silicon with inverse lithography technology (ILT);Pang,2005

5. Real-world impact of inverse lithography technology;Ho,2005

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Curvilinear mask metrology: what is the equivalent critical dimension?;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-06-27

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