Curvilinear mask metrology: what is the equivalent critical dimension?-Reference-Cited by-同舟云学术

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Curvilinear mask metrology: what is the equivalent critical dimension?

Published:2024-06-27 Issue:02 Volume:23 Page:
ISSN:2708-8340
Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
language:
Short-container-title:J. Micro/Nanopattern. Mats. Metro.

Author:

Pang Linyong (Leo)¹,Seal Dakota²,Boettiger Tom²,Shirali Nagesh¹,Dai Grace¹,Fujimura Aki¹

Affiliation:

1. D2S, Inc. (US), San Jose, California, United States

2. Micron Technology, Inc. (US), Boise, Idaho, United States

Publisher

SPIE-Intl Soc Optical Eng

Reference26 articles.

1. Reduction Of Errors Of Microphotographic Reproductions By Optimal Corrections Of Original Masks

2. Image construction through diffraction-limited high-contrast imaging systems: an iterative approach

3. Optimal binary image design for optical lithography

4. Binary and phase-shifting image design for optical lithography

5. Optimum mask and source patterns to print a given shape

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