Binary and phase-shifting image design for optical lithography
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SPIE
Cited by 29 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
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2. Make the impossible possible: use variable-shaped beam mask writers and curvilinear full-chip inverse lithography technology for 193i contacts/vias with mask-wafer co-optimization;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-02-06
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5. Mask Optimization based on artificial desired pattern;2020 International Workshop on Advanced Patterning Solutions (IWAPS);2020-11-05
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