Breakthrough curvilinear ILT enabled by multi-beam mask writing-Reference-Cited by-同舟云学术

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Breakthrough curvilinear ILT enabled by multi-beam mask writing

Published:2021-11-17 Issue:04 Volume:20 Page:
ISSN:2708-8340
Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
language:
Short-container-title:J. Micro/Nanopattern. Mats. Metro.

Author:

Pang Linyong (Leo)¹,Russell Ezequiel Vidal²,Baggenstoss Bill²,Lee Michael²,Digaum Jennefir²,Yang Ming-Chuan²,Ungar P. Jeffrey¹,Bouaricha Ali¹,Wang Kechang¹,Su Bo¹,Pearman Ryan¹,Fujimura Aki¹

Affiliation:

1. D2S, Inc., San Jose, California

2. Micron Technology, Inc., Boise, Idaho

Publisher

SPIE-Intl Soc Optical Eng

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fast and high-fidelity EUV curvilinear mask optimization by distance-versus-angle signature;Optics Express;2024-07-05

2. Curvilinear EUV mask: development of innovative mask metrology;Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology;2022-09-16

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