Optimal binary image design for optical lithography
Author:
Affiliation:
1. Univ. of California/Berkeley (USA)
Publisher
SPIE
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Curvilinear mask metrology: what is the equivalent critical dimension?;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-06-27
2. Make the impossible possible: use variable-shaped beam mask writers and curvilinear full-chip inverse lithography technology for 193i contacts/vias with mask-wafer co-optimization;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-02-06
3. A GPU-Enabled Level-Set Method for Mask Optimization;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023-02
4. Advances in Inverse Lithography;ACS Photonics;2022-09-23
5. Robust and efficient inverse mask synthesis with basis function representation;Journal of the Optical Society of America A;2014-09-26
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