You don’t need 1nm contours for curvilinear shapes: pixel-based computing is the answer-Reference-Cited by-同舟云学术

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You don’t need 1nm contours for curvilinear shapes: pixel-based computing is the answer

Published:2022-12-01 Issue: Volume: Page:
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Container-title:Photomask Technology 2022
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Author:

Shendre Abhishek,Fujimura Aki,Niewczas Mariusz,Kronmiller Tom

Publisher

SPIE

Reference16 articles.

1. Multi-beam mask writer MBM-1000 and its application field;Matsumoto,2016

2. Inverse lithography technology: 30 years from concept to practical, full-chip reality

3. Full-chip GPU-accelerated curvilinear EUV dose and shape correction;Pearman,2017

4. Status of curvilinear data format working group;Choi,2022

5. Enabling faster VSB writing of 193i curvilinear ILT masks that improve wafer process windows for advanced memory applications;Pang,2020

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Why the mask world is moving to curvilinear;DTCO and Computational Patterning III;2024-04-10

2. B-spline and Bézier curvilinear representations: a comparative discussion;Novel Patterning Technologies 2024;2024-04-09

3. Curvilinear mask process correction embedded on multi-beam mask writer;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-02-14

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