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Status of curvilinear data format working group

  • Published:2022-09-16 Issue: Volume: Page:
  • ISSN:
  • Container-title:Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology
  • language:
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Author:

Choi Jin,Ryu Soo,Lee Sukho,Kim Minah,Lee Sanghee,Buck Peter,Durvasula Bhardwaj,Gharat Sayalee,Liubich Vlad

Publisher

SPIE

Reference15 articles.

1. Requirements of data technology for EUV photomask;Jin Choi,2019

2. Diffraction Pattern of a Circle/square Aperture

3. Lithography performance of contact holes: II. Simulation of the effects of reticle corner rounding on wafer print performance;Mack,2000

4. Fast inverse lithography technology;Abrams,2006

5. Inverse lithography technology: 30 years from concept to practical, full-chip reality

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1. Mask deep check to pre-detect defects in curvilinear mask;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-05-26

2. Affordable optical proximity correction runtime for EUV curvilinear mask tape-out flow;DTCO and Computational Patterning III;2024-04-10

3. B-spline and Bézier curvilinear representations: a comparative discussion;Novel Patterning Technologies 2024;2024-04-09

4. Impact of e-beam lithography and data preparation optimization on optical performance of integrated photonic waveguides;Novel Patterning Technologies 2024;2024-04-09

5. Curvilinear mask process correction embedded on multi-beam mask writer;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-02-14
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