Impact of a deformed extreme ultraviolet pellicle in terms of the critical dimension uniformity-Reference-Cited by-同舟云学术

Impact of a deformed extreme ultraviolet pellicle in terms of the critical dimension uniformity

Published:2016-01-29 Issue:2 Volume:15 Page:021003
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Kim In-Seon¹,Yeung Michael²,Barouch Eytan³,Oh Hye-Keun¹

Affiliation:

1. Hanyang University, Applied Physics Department, 55, Hanyangdaehak-ro, Sangrok-gu, Ansan-si, Gyeonggi-do 15588, Republic of Korea

2. Fastlitho, 470 South 2nd Street, San Jose, California 95113, United States

3. Boston University, Department of Mechanical Engineering, 110 Cummington Mall, Boston, Massachusetts 02215, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. International technology roadmap for semiconductors (ITRS);Wilson,2013

2. Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects

3. EUV lithography: NXE platform performance overview

4. EUV mask stack optimization for enhanced imaging performance

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