Author:
van Setten Eelco,Oorschot Dorothe,Man Cheuk-Wah,Dusa Mircea,de Kruif Robert,Davydova Natalia,Feenstra Kees,Wagner Christian,Spies Petra,Wiese Nils,Waiblinger Markus
Cited by
9 articles.
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1. Optimization of absorber and multilayer in EUV mask for 1D and 2D patterns;International Conference on Extreme Ultraviolet Lithography 2018;2018-10-03
2. EUV mask characterization with actinic scatterometry;International Conference on Extreme Ultraviolet Lithography 2018;2018-10-03
3. Investigation of alternative absorbers for extreme ultraviolet mask blanks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-09-01
4. Impact of a deformed extreme ultraviolet pellicle in terms of the critical dimension uniformity;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-01-29
5. Impact of deformed extreme-ultraviolet pellicle in terms of CD uniformity;Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII;2015-07-09