Investigation of EUV pellicle deflection and mechanical stress within EUV inner pod under vacuum activity-Reference-Cited by-同舟云学术

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Investigation of EUV pellicle deflection and mechanical stress within EUV inner pod under vacuum activity

Published:2023-10 Issue: Volume:216 Page:112474
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Kuo Ching-Te^ORCID,Hung Kuo-Kai,Lee Yi-Hsuan,Chiu Bill

Funder

Ministry of Science and Technology

Ministry of Science and Technology, Taiwan

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference30 articles.

1. Development of closed-type EUV pellicle;Ono;Proc. SPIE,2018

2. Development of the breathable frame for closed EUV pellicle;Ishikawa,2019

3. Finishing of EUV Photomask Substrates by CNC Precessed Bonnet Polisher;Beaucamp,2013

4. Novel EUV mask inspection tool with 199-nm laser source and high-resolution optics;Kikuiri,2009

5. Mechanical property measurements of thin films using load-deflection of composite rectangular membranes;Tabata;Sensor. Actuator.,1989

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fatigue spectrum prediction and stretching force estimation of free-standing thin-film membranes for semiconductor manufacturing;Materials Science in Semiconductor Processing;2024-05

2. Wet cleaning of Ta-based extreme ultraviolet photomasks at room temperature;Nanotechnology;2024-02-27

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