Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference36 articles.
1. Tomie, T. , “Method and apparatus for inspecting multilayer masks for defects,’’ U.S. Patent No. 6,954,266 B2 (2005).
2. Concept of ultra-fast at-wavelength inspection of defects on a multilayer mask using a laser-produced plasma source
3. Sensitivity-Limiting Factors of at-Wavelength Extreme Ultraviolet Lithography Mask Blank Inspection
4. Corthout, M. et al., “First tin beta socomo ready for wafer exposure,” inpresented at 2010 Int. Sympo. EUVL, Kobe, Japan (October 2010).
5. LPP source system development for HVM
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