1. Calculating development parameters for chemically amplified resists by the film-reducing method;Sekiguchi,2012
2. Analysis of the generating action of the acid from PAG using Acid Sensitive Dyes;Sekiguchi,2011
3. Analysis of acid-generating action of PAG in an EUV resist using acid sensitive dyes;Sekiguchi,2013
4. Sekiguchi Atsushi and Matsumoto Yoko, “A Study of acid diffusion behaviors from PAG by using tio coat method for ArF Lithography”, proc. of SPIE, vol. 9051, pp.9051 90511S1–90511S13, 2014
5. A Study of Acid Diffusion Behaviors of PAG by using Top Coat Method for EUVL