Author:
Sekiguchi Atsushi,Watanabe Takeo,Kinoshita Hiroo
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference14 articles.
1. [1] Takeo Watanabe, Hiroo Kinoshita, Noriyuki Sakaya, Tsutomu Shoki and Seung Yoon Lee, “Novel Evaluation System for Extreme Ultraviolet Lithography Resist in New SUBARU”, Jap. J. Appl. Phys., 44 (78) (2005) 5556-5559.
2. [2] Laboratory of Advanced Science and Technology for Industry, University of Hyogo http://www.lasti.u-hyogo.ac.jp/NS/facility/bl03/.
3. [4] Atsushi Sekiguchi and Yoko Matsumoto, “A Study of acid diffusion behaviors from PAG by using tio coat method for ArF Lithography”, Proc. SPIE, 9051 (2014) 90511S.
4. [5] Atsushi Sekiguchi, Yoshiyuki Kono and Yoshihisa Sensu, “Study of De-protection Reactions for Chemically Amplified Resists” J. Photopolym. Sci. Technol., 16 (2) (2003) 209-216.
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