EUV APSM mask prospects and challenges
Author:
Publisher
SPIE
Reference25 articles.
1. High-NA EUV lithography exposure tool: key advantages and program progress;Van Schoot,2021
2. Progress in the multi-trigger resist;Popescu,2021
3. Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography
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5. Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?
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1. Weakly guiding approximation of a three-dimensional waveguide model for extreme ultraviolet lithography simulation;Journal of the Optical Society of America A;2024-07-08
2. Maximizing image contrast in printing dense lines-and-spaces patterns;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-05-30
3. Accelerating extreme ultraviolet lithography simulation with weakly guiding approximation and source position dependent transmission cross coefficient formula;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-01-02
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